Ernest Demaray has more than 30 years experience in semi-conductor and energy conversion and storage industries, and over 60 patents, allowed or pending. At Symmorphix, he developed a wide area physical vapor deposition (PVD) process for low temperature fabrication of high performance poly-silicon transistors as well as the newer, biased-pulsed DC sputtering methods for oxide and dielectric alloy films and devices.
In the 1990s, Dr. Demaray was General Manager of Applied Komatsu Technology, Applied Materials’ PVD division, where he developed PVD systems for flat panel displays. During the 1980s at Varian, Dr. Demaray was responsible for the transition from conical sputtering technology to the full-face planar magnetron technology now used widely in the semiconductor industry. During the 1970s at Airco Temescal, Dr. Demaray developed the PVD process now used worldwide for depositing zirconia thermal barriers on turbine engine blades and vanes, a process that has saved 1% jet engine fuel consumption world wide since that time as the CTB technology has been fully adopted.
Dr. Demaray holds a Ph.D. in chemical physics from the University of California, Santa Cruz, where he studied graduate Chemistry and Physics. His thesis was on energy transfer in single state to state atom molecule collisions in crossed beams, up-converting a single vibration with translation in N2 to la photon emitted by the alkaline earth atom. He held a National Science Foundation post-doctoral position at the State University of New York, Stony Brook where he helped develop RMPI resonance enhanced multi-photon photo ionization spectroscopic methods for the study of electronic energy transfer within single molecules.